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Fabrication of enclosed nanochannels in poly(methylmethacrylate) using proton beam writing and thermal bonding

注意:本論文已在APPLIED PHYSICS LETTERS 88, 093515,2006發表
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P. E. Shao(邵培革), A. van Kan, L. P. Wang, K. Ansari, A. A. Bettiol, and F. Watt
Center for Ion Beam Applications (CIBA), Physics Department, National University of Singapore,
2 Science Drive 3, Singapore 117542, Singapore

Abstract: We report a technique for fabricating enclosed nanochannels in polymethylmethacrylatePMMA using proton beam writing coupled with thermal bonding. Using proton beam writing, straight-walled high-aspect-ratio channels can be directly fabricated through a relatively thick PMMA resist layer spin coated on a Kapton film. By thermally bonding the fabricated structures onto bulk PMMA, peeling off the Kapton substrate, and bonding the remaining exposed side to PMMA, enclosed high-aspect-ratio nano/microchannels can be fabricated. Such enclosed channels can be incorporated into fluidic polymeric devices, and the process is compatible with the fabrication of multilevel three-dimensional fluidic chips with vertical interconnects.

 

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