Fabrication of a free standing resolution standard for focusing MeV ion beams to sub 30 nm dimensions注意:本論文已在Nuclear Instruments
and Methods in Physics Research B 231 (2005) 170–175發表 Abstract:With recent advances in
nuclear microscopy, proton beam writing and the recent development of
MeV ion nano probe facilities it is becoming increasingly important to
have resolution standards with a high degree of side wall verticality.
We present here a way of producing a high quality free standing resolution
standards which can be used for high beam current applications like Rutherford
Backscattering Spectrometry (RBS), particle induced X-ray emissions (PIXE),
and low beam current applications such as secondary electron emission,
scanning transmission ion icroscopy (STIM) and ion beam induced current
(IBIC). These standards allow rapid focusing of MeV ion beams for high
resolution nuclear microscopy applications as well as proton beam writing,
where knowledge of the exact beam size is vital to guarantee reproducibility
in writing nanostructures. This new standard has been used to measure
a one-dimensional beam pro?le with 1 MeV protons and gave a FWHM of 29.2
nm which is the smallest value reported for MeV protons in STIM mode. 1、瀏覽PDF格式全文需要使用軟件--Abode Acrobat(由于軟件較大并常見,我站不提供下載) 2、下載論文全文請點擊鼠標右鍵“另存為”或使用網絡螞蟻下載(284KB) 本站收錄的本文作者的其他論文: 4、Dosing system for the nanolitre range,fabricated with the AMANDA process 5、Proton beam fabrication of nickel stamps for nanoimprint lithography |
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