脈沖偏壓對電弧離子鍍Ti/TiN納米多層薄膜顯微硬度的影響
注意：本論文已在《金屬學報》，2005，41（10）：1106-1110發表
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趙彥輝1），林國強1, 2），李曉娜1, 2），董闖1），聞立時1, 3）
1） 大連理工大學三束材料改性國家重點實驗室，大連，116024
2） 大連理工大學物理系，大連，116024
3） 中國科學院金屬研究所，沈陽，110016
摘 要 用脈沖偏壓電弧離子鍍方法在高速鋼基體上沉積Ti/TiN納米多層薄膜，用正交實驗法設計脈沖偏壓電參數，考察脈沖偏壓對Ti/TiN納米多層薄膜顯微硬度的影響。結果表明，在所有偏壓參數（脈沖偏壓幅值、占空比和頻率）和幾何參數（調制周期和周期比）中，脈沖偏壓幅值是影響顯微硬度的最主要因素；當沉積工藝中脈沖偏壓幅值為900V、占空比為50%及頻率為30
kHz時，薄膜硬度可高達34.1GPa，此時多層膜調制周期為84nm，TiN、Ti單元層厚度分別為71nm和13nm；由于薄膜中的單層厚度較厚，納米尺寸的強化效應并未充分體現于薄膜硬度的貢獻中，硬度的提高主要與脈沖偏壓工藝，尤其是脈沖偏壓幅值對薄膜組織的改善有關。
關鍵詞：脈沖偏壓，電弧離子鍍，Ti/TiN納米多層薄膜，顯微硬度
EFFECT OF PULSED BIAS ON MICROHARDNESS OF TI/TIN MULTILAYER FILMS DEPOSITED
BY ARC ION PLATING
ZHAO Yanhui 1), LIN Guoqiang 1, 2) , LI Xiaona 1, 2)
, DONG Chuang 1) ,WEN Lishi 1, 3)
1) State Key Laboratory for Materials Modification by Laser, Ion and Electron
Beams, Dalian University of Technology, Dalian 116024
2) Physics Department, Dalian University of Technology, Dalian 116024
3) Institute of Metals Research, The Chinese Academy of Sciences, Shenyang
110016
Correspondent: LIN Guoqiang, professor, Tel: (0411)84708380-8301, Email:
[email protected]
Supported by National High Technical Research and Development of Programme
of China (2002AA302507)
ABSTRACT Ti/TiN nano-multilayer films were
deposited on high-speed-steel (HSS) substrates using arc ion plating,
in which orthogonal experiments were used to analyze the effects of the
electrical parameters of pulsed bias on microhardness of Ti/TiN multilayer
films. The results show that of all the pulsed bias related parameters
including pulsed bias magnitude, duty ratio and frequency and the geometry
parameters including modulation period and period ratio, pulsed bias magnitude
is the major factor affecting microhardness of the multilayer films. The
maximum microhardness of 34.1GPa was obtained with pulsed bias magnitude
900V, duty ratio 50% and frequency 30kHz, and the responding modulation
period is 84nm, the unit set layer thickness of TiN and Ti are 71nm and
13nm, respectively. Due to the large unit set layer thickness used in
the present experiments, the nano-scale strengthening effect is not obviously
manifested. The increasing of the microhardness correlates in a significant
manner with refining film microstructure resulted from the pulsed bias
parameters especially the pulsed bias magnitude.
KEYWORDS pulsed bias, arc ion plating, Ti/TiN nano-multilayer
films, microhardness
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