CIMS論文的天地

 

Experimental Verification of the Physical Model for Droplet-Particles Cleaning in Pulsed Bias Arc Ion Plating

注意:本論文已在J. Mater. Sci. Technol. 2005,21(3):423-426發表
使用者請注明論文出處

Yanhui ZHAO 趙彥輝1)+ , Guoqiang LIN1), Lishi WEN1, 2) and Chuang DONG1)
1)State Key Laboratory for Materials Modification by Laser, Ion and Electron beams, Dalian University of Technology, Dalian 116024, China
2)Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

Abstract:It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
KEY WORDS: Arc ion plating, Pulsed bias, TiN film, Droplet-particles

 

1瀏覽PDF格式全文需要使用軟件--Abode Acrobat(由于軟件較大并常見,我站不提供下載)

2、下載論文全文請點擊鼠標右鍵“另存為”或使用網絡螞蟻下載(104KB)


作者點評:

 

歡迎您參加討論,發表您對此論文及其研究領域的看法!
(請在發言時在標題中使用所點評的論文的題目或研究方向,這樣方便大家瀏覽!)

返回首頁 | CIMS論文 | 并行工程 | 虛擬制造 | 敏捷制造 | 其他論文 | 項目開發 | 學術資源 | 站內全文搜索 | 免費論文網站大全 |

line.gif (4535 字節)

為了更好的為大家服務,歡迎您參加本站的投票調查

>>>>參加更多投票調查請點擊!

本站永久域名:http://www.sqvswk.live歡迎訪問

注意:本站內容未經書面允許不得轉載

All rights reserved, all contents copyright 2000-2019
本站自2000年3月總網頁訪問量為
pk10开奖记录直播